Journal Publications

Enhanced Ferroelectric Polarization in TiN/HfO2/TiN Capacitors by Interface Design

: Journal Publications

Published in ACS Applied Electronic Materials (06 September 2020)

DOI: https://doi.org/10.1021/acsaelm.0c00503

By Thomas Szyjka, Lutz Baumgarten, Terence Mittmann, Yury Matveyev, Christoph Schlueter, Thomas Mikolajick, Uwe Schroeder, and Martina Müller

Lanthanum doping induced structural changes and their implications on ferroelectric properties of Hf1−xZrxO2 thin film

: Journal Publications

Published in Applied Physics Letters (01 September 2020)

DOI: https://doi.org/10.1063/5.0021007

By Furqan Mehmood, Thomas Mikolajick, and Uwe Schroeder

Depletion induced depolarization field in Hf1−xZrxO2 metal-ferroelectric-semiconductor capacitors on germanium

: Journal Publications

Published in Applied Physics Letters (07 May 2020)

DOI: https://doi.org/10.1063/5.0007111

By C. Zacharaki, P. Tsipas, S. Chaitoglou, E. K. Evangelou, C. M. Istrate, L. Pintilie, and A. Dimoulas

The full paper can be found here: https://zenodo.org/record/3816661

Interface chemistry of pristine TiN/La:Hf0.5Zr0.5O2 capacitors

: Journal Publications

Published in Applied Physics Letters (26 June 2020)

DOI: https://doi.org/10.1063/5.0012595

By W. Hamouda, C. Lubin, S. Ueda, Y. Yamashita, O. Renault, F. Mehmood, T. Mikolajick, U. Schroeder, R. Negrea, and N. Barrett

Physical chemistry of the TiN/Hf0.5Zr0.5O2 interface

: Journal Publications

Published in Journal of Applied Physics (11 February 2020)

DOI: https://doi.org/10.1063/1.5128502

By W. Hamouda, A. Pancotti, C. Lubin, L. Tortech, C. Richter, T. Mikolajick, U. Schroeder, and N. Barrett