Journal Publications

Hf0.5Zr0.5O2-Based Germanium Ferroelectric p-FETs for Nonvolatile Memory Applications

: Journal Publications

Published in ACS Appl. Electron. Mater. (24 May 2022)

DOI: 10.1021/acsaelm.2c00324

By Christina Zacharaki, Stefanos Chaitoglou, Nikitas Siannas, Polychronis Tsipas, and Athanasios Dimoulas

The full paper can be found here: https://zenodo.org/record/6579695#.YpBqr6hByUn

Ferroelectricity Improvement in Ultra-Thin Hf0.5Zr0.5O2 Capacitors by the Insertion of a Ti Interfacial Layer

: Journal Publications

Published in Phys. Status Solidi RRL (09 March 2022)

DOI: https://doi.org/10.1002/pssr.202100583

By Greta Segantini, Rabei Barhoumi, Benoît Manchon, Ingrid Cañero Infante, Pedro Rojo Romeo, Matthieu Bugnet, Nicolas Baboux, Shruti Nirantar, Damien Deleruyelle, Sharath Sriram, and Bertrand Vilquin.

The atomic and electronic structure of Hf0.5Zr0.5O2 and Hf0.5Zr0.5O2:La films

: Journal Publications

Published in Journal of Science: Advanced Materials and Devices (December 2021)

DOI: https://doi.org/10.1016/j.jsamd.2021.08.001

By Timofey V. Perevalov, Igor P. Prosvirin, Evgenii A. Suprun, Furqan Mehmood, Thomas Mikolajick, Uwe Schroeder, and Vladimir A. Gritsenko

Hard x-ray photoelectron spectroscopy of tunable oxide interfaces

: Journal Publications

Published in Journal of Vacuum Science & Technology A (27 December 2021)

DOI: https://doi.org/10.1116/6.0001491

By Martina Müller, Patrick Lömker, Paul Rosenberger, Mai Hussein Hamed, David N. Mueller, Ronja A. Heinen, Thomas Szyjka, and Lutz Baumgarten

Pyroelectric dependence of atomic layer-deposited Hf0.5Zr0.5O2 on film thickness and annealing temperature

: Journal Publications

Published in Applied Physics Letters (13 September 2021)

DOI: https://doi.org/10.1063/5.0062789

By Patrick D. Lomenzo, Ruben Alcala, Claudia Richter, Songrui Li, Thomas Mikolajick, and Uwe Schroeder