Reliability aspects of ferroelectric TiN/Hf0.5Zr0.5O2/Ge capacitors grown by plasma assisted atomic oxygen deposition Journal Publications Published in Applied Physics Letters (24 November 2020) DOI: 10.1063/5.0029657 By C. Zacharaki, P. Tsipas, S. Chaitoglou, L. Bégon-Lours, M. Halter, and A. Dimoulas The full paper can be found here: https://zenodo.org/record/4288888#.YA_NfOgzaUk
