Imprint issue during retention tests for HfO2-based FRAM: An industrial challenge?

Imprint issue during retention tests for HfO2-based FRAM: An industrial challenge?

: Journal Publications

Published in Applied Physics Letters (23 February 2021)

DOI: https://doi.org/10.1063/5.0035687

By J. Bouaziz, P. Rojo Romeo, N. Baboux, and B. Vilquin

The full paper can be found here: https://hal.archives-ouvertes.fr/hal-03177059