Pyroelectric dependence of atomic layer-deposited Hf0.5Zr0.5O2 on film thickness and annealing temperature Journal Publications Published in Applied Physics Letters (13 September 2021) DOI: https://doi.org/10.1063/5.0062789 By Patrick D. Lomenzo, Ruben Alcala, Claudia Richter, Songrui Li, Thomas Mikolajick, and Uwe Schroeder
