Ferroelectricity Improvement in Ultra-Thin Hf0.5Zr0.5O2 Capacitors by the Insertion of a Ti Interfacial Layer

Ferroelectricity Improvement in Ultra-Thin Hf0.5Zr0.5O2 Capacitors by the Insertion of a Ti Interfacial Layer

: Journal Publications

Published in Phys. Status Solidi RRL (09 March 2022)

DOI: https://doi.org/10.1002/pssr.202100583

By Greta Segantini, Rabei Barhoumi, Benoît Manchon, Ingrid Cañero Infante, Pedro Rojo Romeo, Matthieu Bugnet, Nicolas Baboux, Shruti Nirantar, Damien Deleruyelle, Sharath Sriram, and Bertrand Vilquin.