Insertion of an Ultra-thin Interfacial Aluminium Layer for the Realisation of a Hf0.5Zr0.5O2 Ferroelectric Tunnel Junction

Published in Phys. Status Solidi RRL (09 March 2022)

DOI: https://doi.org/10.1002/pssr.202100585

By Benoît Manchon, Greta SegantiniNicolas BabouxPedro Rojo RomeoRabei BarhoumiIngrid C. InfanteFabien AlibartDominique DrouinBertrand Vilquin, and Damien Deleruyelle

The full paper can be found here: https://hal.archives-ouvertes.fr/hal-03609773


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