Journal Publications

Lanthanum doping induced structural changes and their implications on ferroelectric properties of Hf1−xZrxO2 thin film

: Journal Publications

Published in Applied Physics Letters (01 September 2020)

DOI: https://doi.org/10.1063/5.0021007

By Furqan Mehmood, Thomas Mikolajick, and Uwe Schroeder

Interface chemistry of pristine TiN/La:Hf0.5Zr0.5O2 capacitors

: Journal Publications

Published in Applied Physics Letters (26 June 2020)

DOI: https://doi.org/10.1063/5.0012595

By W. Hamouda, C. Lubin, S. Ueda, Y. Yamashita, O. Renault, F. Mehmood, T. Mikolajick, U. Schroeder, R. Negrea, and N. Barrett

Physical chemistry of the TiN/Hf0.5Zr0.5O2 interface

: Journal Publications

Published in Journal of Applied Physics (11 February 2020)

DOI: https://doi.org/10.1063/1.5128502

By W. Hamouda, A. Pancotti, C. Lubin, L. Tortech, C. Richter, T. Mikolajick, U. Schroeder, and N. Barrett

Depletion induced depolarization field in Hf1−xZrxO2 metal-ferroelectric-semiconductor capacitors on germanium

: Journal Publications

Published in Applied Physics Letters (07 May 2020)

DOI: https://doi.org/10.1063/5.0007111

By C. Zacharaki, P. Tsipas, S. Chaitoglou, E. K. Evangelou, C. M. Istrate, L. Pintilie, and A. Dimoulas

The full paper can be found here: https://zenodo.org/record/3816661

Bulk Depolarization Fields as a Major Contributor to the Ferroelectric Reliability Performance in Lanthanum Doped Hf0.5Zr0.5O2 Capacitors

: Journal Publications

Published in Advanced Materials Interfaces (06 September 2019)

DOI: https://doi.org/10.1002/admi.201901180

By Furqan Mehmood, Michael Hoffmann, Patrick D. Lomenzo, Claudia Richter, Monica Materano, Thomas Mikolajick, and Uwe Schroeder